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Effect of Bias Voltage on Substrate for the Structure and Electrical Properties of Y:HfO2 Thin Films Deposited by Reactive Magnetron Co-Sputtering

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Date of Publication:2022-10-02

Journal:ADVANCED ELECTRONIC MATERIALS

Volume:7

Issue:10

ISSN No.:2199-160X

Key Words:"leakage current; roughness; substrate bias; Y; HfO; (2)"

Pre One:Effect of annealing protection atmosphere on the ferroelectric yttrium doped hafnium oxide thin films

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