Effect of Bias Voltage on Substrate for the Structure and Electrical Properties of Y:HfO2 Thin Films Deposited by Reactive Magnetron Co-Sputtering
Release Time:2024-04-29 Hits:
Date of Publication: 2022-10-02
Journal: ADVANCED ELECTRONIC MATERIALS
Volume: 7
Issue: 10
ISSN: 2199-160X
Key Words: "leakage current; roughness; substrate bias; Y; HfO; (2)"