Effect of Y concentration and film thickness on microstructure and electrical properties of HfO2 based thin films
Release Time:2024-04-29 Hits:
Date of Publication: 2022-10-02
Journal: CERAMICS INTERNATIONAL
Volume: 47
Issue: 9
Page Number: 12137-12143
ISSN: 0272-8842
Key Words: "Y doped HfO2; Dielectric film; Phase transition; Electronic structure"
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