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一种采用反应磁控溅射制备二氧化铪基铁电薄膜的方法

Release Time:2022-10-19  Hits:

First Author: Dayu ZHOU

Disigner of the Invention: 孙纳纳,徐进,徐军,zhangyu,赵鹏

Institution: 材料科学与工程学院

Application Number: CN108441830A

Authorization Number: CN201810171185.0

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