location: Current position: Home >> Scientific Research >> Paper Publications

Chemical-mechanical wear of monocrystalline silicon by a single pad asperity

Hits:

Date of Publication:2022-10-05

Journal:INTERNATIONAL JOURNAL OF MACHINE TOOLS MANUFACTURE

Volume:120

Page Number:61-71

ISSN No.:0890-6955

Pre One:Cu2+浓度对于铜电致化学抛光过程的影响

Next One:A novel approach of chemical mechanical polishing using environment-friendly slurry for mercury cadmium telluride semiconductors