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Indexed by:期刊论文

Date of Publication:2022-06-29

Journal:机械工程学报

Affiliation of Author(s):机械工程学院

Issue:9

Page Number:169-174

ISSN No.:0577-6686

Abstract:Further development of ultra-large-scale integration (ULSI) is restricted by the state-of-the-art of the planarization technology due to the further micronization of the characteristic line width. Flow property of the polishing slurry is one of the important factors influencing the efficiency and performance of the planarization process. It is verified in practice that the grooved pad will enhance the transport of the slurry to and from the wafer center. The microscale flow of polishing slurry on the multilevel rough surface of grooved pad is taken as a study object. The simulated production technique is used to generate the multilevel rough surface, and a new computational fluid dynamic method, Lattice Boltzmann method (LBM), is used to analyze the flow of slurry in the multilevel rough gap. The flow characteristic of the slurry on the multilevel rough surface and the effect of pad topography on the flow of slurry are studied preliminarily. The results show that the present method can be used to analyze the effect of the geometrical parameters of pad on the transport of the polishing slurry and possesses good statistical property. The theoretical research method developed is helpful to the design and manufacture of a new generation pad and also to the pad conditioning. © 2011 Journal of Mechanical Engineering.

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