Hits:
Date of Publication:2024-09-06
Journal:JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
Volume:330
ISSN No.:0924-0136
Key Words:CMP; COLLOIDAL SILICA; COPPER; H2O2; POTASSIUM PERIODATE; RU; SLURRY; SPECTROSCOPY; SURFACE; WEAR
Pre One:Propagation mechanism of E’-center and NBOHC in fused silica induced by gamma-ray irradiation
Next One:Ultralow reflectance induced by nanowire array on polycrystalline diamond