2015 英特尔国家大学生创新创业训练计划：化学机械抛光 （CMP）硅晶圆材料去除率和抛光垫磨损率模拟仿真
Release Time:2017-03-19 Hits:
Leading Scientist: Dong Zhigang
Project Source: 国际合作项目
Status: 结题
Supported by: Intel Semiconductor (US) LLC
Nature of Project: 纵向
Date of Project Approval: 2015-11-16
Scheduled Completion Time: 2016-06-30
Date of Project Initiation: 2015-11-16