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阴离子对化学镀Ni-Cu-P合金耐蚀性的影响

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Indexed by:期刊论文

Date of Publication:2010-08-20

Journal:辽宁化工

Volume:39

Issue:8

Page Number:794-796

ISSN No.:1004-0935

Key Words:化学镀;Ni-Cu-P;耐蚀性能;钝化

Abstract:采用化学镀工艺在铜基体表面沉积Ni-Cu-P镀层,利用扫描电镜(SEM)和电子能谱(EDX)对Ni-Cu-P镀层的形貌和成分进行了分析.同时,采用极化曲线(PC)和交流阻抗(EIS)研究了常温下Ni-Cu-P镀层在0.1 mol/L,0.001 mol/L的NaCl,Na2SO4,NaNO3和NaNO2电解质中的耐蚀性能.结果表明,在较高浓度下,氯离子和硫酸根离子的活性吸附作用能够促进镀层中Ni的溶解,从而也加速了镀层的表面钝化,在较低浓度下,氯离子和硫酸根离子的活性吸附作用减弱,镀层很难钝化;硝酸根离子和亚硝酸根离子在高浓度和低浓度下均很难使镀层钝化.

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