Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2011-07-15

Journal: ELECTROCHIMICA ACTA

Included Journals: EI、SCIE、Scopus

Volume: 56

Issue: 18

Page Number: 6277-6283

ISSN: 0013-4686

Key Words: Galvanic deposition; Supporting electrolyte; Cu2O; Octahedral

Abstract: The effects of introduced supporting electrolyte on the galvanic deposition of Cu2O crystals have been investigated using scanning electron microscopy (SEM), energy-dispersive X-ray (EDX), X-ray diffraction (XRD). The results show that the chemical nature of supporting electrolytes plays very important roles in the galvanic deposition of Cu2O crystals. The chloride stabilizes the (1 0 0) planes of Cu2O crystals, resulting in the formation of cubic crystals, while nitrate, sulfate and fluoride stabilize the (1 1 1) planes of Cu2O crystals, leading to the deposition of truncated octahedral and octahedral Cu2O crystals. It provides a facile way to control the morphology of galvanically obtained Cu2O crystals by indirectly adjusting the inorganic adsorption agents. (C) 2011 Elsevier Ltd. All rights reserved.