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一种高纯多晶硅溅射靶材及其制备方法和应用

Release Time:2019-10-11  Hits:

First Author: 李鹏廷

Disigner of the Invention: 孟剑雄,王峰,姜大川,Yi Tan,张磊,石爽

Application Number: CN201810134015.5

Authorization Date: 2018-02-09

Authorization Number: CN108359949A

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