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一种高纯多晶硅溅射靶材及其制备方法和应用

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First Author:lipengting

Disigner of the Invention:shishuang,张磊,Yi Tan,jiangdachuan,王峰,孟剑雄

Application Number:CN201810134015.5

Authorization Date:2018-02-09

Authorization number:CN108359949A

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