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一种高纯多晶硅溅射靶材及其制备方法和应用

Release Time:2022-10-19  Hits:

First Author: 李鹏廷

Disigner of the Invention: 石爽,张磊,Yi Tan,姜大川,王峰,孟剑雄

Institution: 材料科学与工程学院

Application Number: CN108359949A

Authorization Number: CN201810134015.5

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