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Indexed by:期刊论文

Date of Publication:2013-03-01

Journal:CHEMICAL VAPOR DEPOSITION

Included Journals:SCIE、EI、Scopus

Volume:19

Issue:1-3

Page Number:68-73

ISSN No.:0948-1907

Key Words:Formation mechanism; In-situ FTIR; Manganese silicide; Mn(CO)(5)SiCl3; MOCVD

Abstract:MnSi nanoparticles on silica are prepared by metal-organic (MO)CVD of Mn(CO)5SiCl3 as a single-source precursor. Mn(CO)5SiCl3 is synthesized from Mn2(CO)10 and SiHCl3 using standard Schlenk techniques, and confirmed by Fourier transform infrared (FTIR), single-crystal X-ray diffraction (XRD), and 13C and 29Si nuclear magnetic resonance (NMR). Powder XRD patterns, high resolution transmission electron microscopy (HRTEM), elemental maps, and energy dispersive X-ray (EDX) spectroscopy show that MnSi particles, with a size of about 56nm, are uniformly dispersed on the silica support. The formation mechanism of MnSi nanoparticles on silica is investigated by in-situ FTIR spectroscopy. The results demonstrate the formation details of MnSi nanoparticles from Mn(CO)5SiCl3 through the elimination of carbonyl groups and dissociation of SiCl bonds with the promotion of H2.