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论文类型：期刊论文

发表时间：2017-04-07

发表刊物：CHEMCATCHEM

收录刊物：SCIE、EI

卷号：9

期号：7

页面范围：1337-1342

ISSN号：1867-3880

关键字：chemical vapor deposition; hydrogenation; nickel; silicon; supported catalysts

摘要：Metal silicide (Pd2Si, Ni2Si, CoSi, FexSi, and Cu6.69Si) catalysts supported by SBA-15 have been prepared by a chemical vapor deposition method under a H-2 atmosphere using (CH3)(2)SiCl2 as the Si source. Of the SBA-15-supported metal silicide catalysts, Ni2Si/SBA-15 presented a modest activity, notable selectivity to styrene (>90%), and high stability with respect to the selective hydrogenation of phenylacetylene, which is attributed to the active-site isolation and electron transfer in the silicide. Furthermore, Ni2Si/SBA-15 also has a high selectivity to diphenylacetylene and 1,4-butynediol, which demonstrates that Ni2Si/SBA-15 is a promising, low-cost catalyst alternative to noble-metal catalysts as a selective hydrogenation catalyst.