Indexed by:Journal Papers
Date of Publication:2017-09-21
Journal:ASAIO journal (American Society for Artificial Internal Organs : 1992)
Included Journals:SCIE、PubMed
Volume:64
Issue:3
Page Number:338-350
ISSN No.:1538-943X
Key Words:biventricular assist devices; flow balancing; physiologic control; suction prevention; sensor control algorithm
Abstract:Rotary biventricular assist devices (BiVAD) are becoming a clinically accepted treatment option for end-stage biventricular failure. To improve BiVAD efficacy and safety, we propose a control algorithm to achieve the clinical objectives of maintaining left-right-sided balance, restoring physiologic flows, and preventing ventricular suction. The control algorithm consists of two proportional-integral (PI) controllers for left and right ventricular assist devices (LVAD and RVAD) to maintain differential pump pressure across LVAD (DeltaPL) and RVAD (DeltaPR) to provide left-right balance and physiologic flow. To prevent ventricular suction, LVAD and RVAD pump speed differentials (DeltaRPML, DeltaRPMR) were maintained above user-defined thresholds. Efficacy and robustness of the proposed algorithm were tested in silico for axial and centrifugal flow BiVAD using 1) normal and excessive DeltaPL and/or DeltaPR setpoints, 2) rapid threefold increase in pulmonary vascular or vena caval resistances, 3) transient responses from exercise to rest, and 4) ventricular fibrillation. The study successfully demonstrated that the proposed BiVAD algorithm achieved the clinical objectives but required pressure sensors to continuously measure DeltaPL and DeltaPR. The proposed control algorithm is device independent, should not require any modifications to the pump or inflow/outflow cannulae/grafts, and may be directly applied to current rotary blood pumps for biventricular support.
Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates
Gender:Male
Alma Mater:中佛罗里达大学
Degree:Doctoral Degree
School/Department:生物医学工程学院
Discipline:Biomedical Engineering. Measuring Technology and Instrument
Business Address:厚坤楼D227
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