边继明

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:男

毕业院校:中科院上海硅酸盐研究所

学位:博士

所在单位:物理学院

学科:微电子学与固体电子学. 凝聚态物理

办公地点:大连理工大学科技园C座301-1办公室

联系方式:E-mail:jmbian@dlut.edu.cn.

电子邮箱:jmbian@dlut.edu.cn

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Preparation and Characteristics of GaN Films on Freestanding CVD Thick Diamond Films

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论文类型:期刊论文

发表时间:2010-01-01

发表刊物:CHINESE PHYSICS LETTERS

收录刊物:SCIE、ISTIC

卷号:27

期号:1

ISSN号:0256-307X

摘要:Prefer-oriented and fine grained polycrystalline GaN films are prepared by plasma enhanced metal organic chemical vapour deposition on nucleation surfaces of freestanding thick diamond films. The characteristics of the GaN films are characterized by x-ray diffraction, reflection high energy electron diffraction and atomic force microscopy. The results indicate that the structure and morphology of the films are strongly dependent on the deposition temperature. The most significant improvements in morphological and structural properties of GaN films are obtained under the proper deposition temperature of 400 degrees C.