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脉冲激光弯曲成形技术中硅片表面的形貌分析

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Date of Publication:2007-01-01

Journal:中国激光

Affiliation of Author(s):机械工程学院

Issue:11

Page Number:1589-1593

ISSN No.:0258-7025

Abstract:Surface properties such as profile and crystal phase of bent silicon samples by long laser pulses were analyzed. The results indicated that the irradiated surface was divided into ambient region, transition region and main function region. The surfaces of the transition region and main function region were changed seriously, and massing stacking fault and ripple profile were found respectively. The typical transformation of amorphous silicon was not found at Raman spectrum of the main function region, and only existed tiny Si-I&rarrSi-III conversion. Meanwhile the crystal-plane orientation was changed seriously compared to the initial crystal-plane by X-ray crystal-plane identification, and crystal distortion and thinning appeared in the region irradiated.

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