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Indexed by:期刊论文

Date of Publication:2016-08-15

Journal:CERAMICS INTERNATIONAL

Included Journals:SCIE、EI、Scopus

Volume:42

Issue:11

Page Number:12623-12629

ISSN No.:0272-8842

Key Words:Electrohydrodynamic atomization deposition; PZT thick film; Mechanical polishing

Abstract:In this work, electrohydrodynamic atomization deposition, combined with mechanical polishing, was used for the fabrication of dense and even PZT thick films. The PZT slurry was ball-milled and the effect of milling time on the characteristics of the deposited films was examined. A time of 50 h was found to be the optimum milling time to produce dense films. It was found that the PZT thick films presented rough surface after deposition. In order to overcome this drawback the mechanical polishing process was employed on the deposited films. After the mechanical polishing the roughness (Ra) and peak-to-peak height (Rz) of the film surface were decreased from 422 nm to 23 nm and from 5 pm to 150 nm, respectively. Subsequently, an increase of similar to 10 pC N-1 on piezoelectric constant (d(33.f)) was obtained. In addition, it was observed that the d(33) was increased from 57 pC N-1 to 89 pC N-1 when the thickness was increased from 10 mu m to 80 mu m. (C) 2016 Elsevier Ltd and Techna Group S.r.l. All rights reserved.