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论文类型：期刊论文

发表时间：2021-01-11

发表刊物：MICRO & NANO LETTERS

卷号：9

期号：2

页面范围：136-140

ISSN号：1750-0443

关键字：electrical resistivity; electrohydrodynamics; photolithography; photoresists; suspensions; thin films; graphene; graphene microscale structure patterning; electrohydrodynamic deposition; photoresist moulds; graphene suspension; graphene thin films; atomisation-substrate distance; sheet resistances; deposition distance; sharp-angled heave surface behaviour; electrohydrodynamic atomisation; photolithography polymeric micromoulding technique; graphene structures; photoresist micromould; C

摘要：In this reported work, a graphene suspension was atomised and deposited using the electrohydrodynamic atomisation technique, enabling the formation of a wide range of graphene thin films. The influences of the atomisation-substrate distance on the characteristics of the graphene films and their sheet resistances were analysed. A distance of 3 mm was found to be the optimum deposition distance for this graphene suspension to produce an even film and a low sheet resistance. At a lower and a higher working distance the graphene films exhibited a sharp-angled heave surface behaviour and a high sheet resistance. In addition, electrohydrodynamic atomisation combined with a photolithography polymeric micromoulding technique was used to form graphene structures. After removing the photoresist micromould, the graphene structures remained under well-arranged characteristics. After two layers of electrohydrodynamic atomisation deposition at a working distance of 3 mm, the thickness of the film was approximate to 400 nm and exhibited a sheet resistance of 127.5 sq(-1) (ohms per square).