
教授 博士生导师 硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:材料科学与工程学院
学科:材料学
功能材料化学与化工
化学工程
办公地点:材料楼330办公室
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发布时间:2019-03-11
论文类型:会议论文
发表时间:2013-08-11
收录刊物:Scopus、CPCI-S、EI
页面范围:126-129
关键字:liquid-solid electromigration (L-S EM); Sn-9Zn solder; intermetallic compound (IMC); reverse polarity effect; synchrotron radiation real-time in situ imaging technology
摘要:Synchrotron radiation real-time in situ imaging technology was conducted to investigate the interfacial reaction in line-type Cu/Sn-9Zn/Cu interconnect under a current density of 1.2x10(4) A/cm(2) at 250 degrees C. A reverse polarity effect, i.e., the intermetallic compound (IMC) layer at the cathode grew continuously while that at the anode was restrained, was observed in Cu/Sn-9Zn/Cu interconnects. With increasing liquid-solid electromigration (L-S EM) time, the initial interfacial Cu5Zn8 gradually transformed into Cu-6(Sn,Zn)(5) at the anode, while into a mixture of Cu5Zn8 and Cu-6(Sn,Zn)(5) at the cathode. This provided a clear evidence that Zn atoms were migrating from the anode toward the cathode undergoing L-S EM, which is different from the normal diffusion behavior of atoms. Since there is no back-stress undergoing L-S EM, it is deduced that the effective charge number (Z*) of Zn atoms became positive, resulting in the directional migration of Zn atoms from the anode toward the cathode under electron current stressing.