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黄明亮
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性别: 男

毕业院校: 大连理工大学

学位: 博士

所在单位: 材料科学与工程学院

学科: 材料学. 功能材料化学与化工. 化学工程

办公地点: 材料楼330办公室

联系方式: 0411-84706595

电子邮箱: huang@dlut.edu.cn

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当前位置: 黄明亮 >> 科学研究 >> 论文成果
Effects of Plating Parameters on the Au-Sn Co-electrodepositon for Flip Chip-LED Bumps

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论文类型: 会议论文

发表时间: 2011-08-08

收录刊物: EI、CPCI-S、Scopus

页面范围: 1111-1115

摘要: The Au-Sn alloy was successfully pulse electrodeposited in a new non-cyanide and non-toxic stable electroplating bath which basically was composed of Au compound and tin sulfate (SnSO4). The composition and morphology of electrodeposited Au-Sn alloy were investigated in terms of current density, temperature and pH value in the developed bath. It was possible to control tin content in the electrodeposits by means of current density. Au-Sn alloy with Sn concentration of about 20 to 45 at.% was deposited at peak current density ranging from 3 mA/cm(2) to 45 mA/cm(2). Although the microstructure and surface morphology of the electrodeposits were influenced by the peak current density, dense and smooth Au-Sn films with fine grain had been electroplated at different current density. With increasing pH value, the tin content in the alloy was obviously increased from about 10 to 45 at.%. When the pH value was greater than 8.5, the deposits became porous and incompact mainly owing to the hydrogen evolution reaction during plating. With increasing temperature, the tin content was slightly changed, however, the grain size became bigger and the films had a tendency towards coarser because of the rapid consumption of metallic ions. Therefore, it can be concluded that the optimum condition of pH value for electroplating of Au-Sn alloys was ranging from 7.5 to 8 and that of temperature was 35 to 45 degrees C.

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