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论文类型： 期刊论文

发表时间： 2018-01-01

发表刊物： OPTIK

收录刊物： SCIE、EI

卷号： 166

页面范围： 278-284

ISSN号： 0030-4026

关键字： Ion beam sputtering; Ta2O5 film; Oxygen flow; Optical properties; Residual stress

摘要： High precision optical components, such as ultra-high reflectors, severely suffer from absorption losses. In order to get optical films with low absorption losses, many techniques, such as annealing and laser conditioning, have been widely employed as a post-deposition treatment process to deal with as-deposited films. However, the success of these processes starts with the correct choice of the deposition parameters. In this paper, Ta2O5 films are deposited by dual ion beam sputtering (DIBS) method and the effects of target oxygen flows on optical properties, microstructure and residual stress are systematically investigated. The results show that target oxygen flows can significantly affect the absorption losses and residual stress of Ta2O5 film. The XRD patterns reveal that Ta2O5 films deposited at different parameters are all amorphous. Finally, based on the results of Ta2O5 films, broadband dielectric mirror with high reflection and low absorption losses in the range from 380 nm to 750 nm is successfully fabricated. (C) 2018 Elsevier GmbH. All rights reserved.