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黄明亮
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教授   博士生导师   硕士生导师

性别: 男

毕业院校: 大连理工大学

学位: 博士

所在单位: 材料科学与工程学院

学科: 材料学. 功能材料化学与化工. 化学工程

办公地点: 材料楼330办公室

联系方式: 0411-84706595

电子邮箱: huang@dlut.edu.cn

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Effect of Soldering Sequences on Cu-Ni interaction in flip-chip interconnects

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论文类型: 会议论文

发表时间: 2018-01-01

收录刊物: SCIE、CPCI-S

页面范围: 1368-1371

关键字: sequential soldering; Sn-Cu-Ni; initial Cu concentration; Ni diffusion; cross-solder interaction

摘要: The effect of sequential soldering and initial Cu concentration in solders on the interfacial reaction, especially the morphology, growth of IMC and Cu consumption, were investigated by using 300-mu m (diameter) various composition of solder balls and substrates with a 250-mu m (diameter) opening of OSP and ENIG pads. Two paths were employed. For path I, a solder ball was first joined to the Cu substrate and then to the Ni substrate. For path II, the sequence was the opposite. Main IMCs found at the interfaces on both sides were Cu6Sn5 and (Cu,Ni)(6)Sn-5 for interconnects via path I, while for path II, IMCs on Ni side affected the interfacial reaction on Cu side with a novel (Cu,Ni)(6)Sn-5 bedded IMCs morphology. A mechanism was introduced to illustrate the phenomenon. In addition, the thickness of IMCs and Cu consumption depended on soldering sequences and initial Cu concentration in solders.

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