教授 博士生导师 硕士生导师
性别: 男
毕业院校: 大连理工大学
学位: 博士
所在单位: 材料科学与工程学院
学科: 材料学. 功能材料化学与化工. 化学工程
办公地点: 材料楼330办公室
联系方式: 0411-84706595
电子邮箱: huang@dlut.edu.cn
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论文类型: 期刊论文
发表时间: 2013-06-01
发表刊物: SCRIPTA MATERIALIA
收录刊物: SCIE、EI、Scopus
卷号: 68
期号: 11
页面范围: 853-856
ISSN号: 1359-6462
关键字: Reverse polarity effect; Cu/Sn-9Zn/Cu; Interfacial reaction; Effective charge number; Liquid solid electromigration
摘要: Synchrotron radiation real-time in situ imaging technology was used to study the interfacial reaction in Cu/Sn-9Zn/Cu interconnect during liquid solid electromigration. The reverse polarity effect, evidenced by the IMC layer at the cathode growing continuously while that at the anode was restrained, resulted from the directional migration of Zn atoms toward the cathode under electron current stressing, which is induced by the positive effective charge number of Zn atoms but not by the back-stress. The severe dissolution of Cu anode was explained theoretically. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.