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Microstructural Evolution of Oxidation Film on a Single Crystal Nickel-Based Superalloy at 980 A degrees C
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论文类型: 期刊论文
发表时间: 2018-04-01
发表刊物: OXIDATION OF METALS
收录刊物: SCIE、EI、Scopus
卷号: 89
期号: 3-4
页面范围: 303-317
ISSN号: 0030-770X
关键字: Nickel-based; Superalloy; Oxidation; Alumina; Film
摘要: The isothermal oxidation behavior of a single crystal nickel-based superalloy was investigated at 980 A degrees C through XRD, SEM/EDX and EPMA. The mass gain process exhibited two periods: an initial stage followed by a steady-state stage. Based on the experimental results, the rapid formation of alumina and NiO was responsible for the initial stage of mass gain, and the formation of complex spinels phases may dramatically effect on the steady stage. The microstructure of oxidation film, from the top surface down to the base material, was clarified as Ni-rich oxides, Ni-Cr oxides, Cr-Ta-Co oxides, Ni-Al oxides and finally a continuous Al2O3. In addition, AlN formed in the gamma'-free zone. The effect of oxidation film evolution on the oxidation kinetics and mechanism were discussed.

程从前

副教授   博士生导师   硕士生导师

任职 : 院长助理,中国腐蚀与防护学会高温专业委员会委员,中国机械工程学会理化检验分委员会委员,辽宁省化工学会腐蚀与防护专业委员会委员

性别: 男

毕业院校:大连理工大学

学位: 博士

所在单位:材料科学与工程学院

学科:材料学

电子邮箱:cqcheng@dlut.edu.cn

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