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个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:机械工程学院
学科:机械制造及其自动化
办公地点:大连理工大学机械工程学院知方楼5009
联系方式:pzhou@dlut.edu.cn
电子邮箱:pzhou@dlut.edu.cn
A new method for measuring the flatness of large and thin silicon substrates using a liquid immersion technique
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论文类型:期刊论文
发表时间:2015-11-01
发表刊物:MEASUREMENT SCIENCE AND TECHNOLOGY
收录刊物:SCIE、EI、Scopus
卷号:26
期号:11
ISSN号:0957-0233
关键字:thin substrate; wafer; flatness measurement; liquid immersion
摘要:Flatness measurements of thin and large substrates are greatly affected by gravity. In this work, a new method was proposed for accurately measuring the flatness error of large and thin silicon wafers using a floating technique. In this method, a silicon wafer was immersed in a liquid that had a density slightly lower than that of silicon and was supported by three ball supporters in the liquid. The wafer shape was measured using a laser triangulation sensor. The buoyancy force on the wafer inside the liquid could cancel out most of the effect of gravity. The residual effect of gravity was further removed by subtracting the residual deflection calculated by finite-element modeling from the measured result. The method was validated by comparing the flatness values of a thick wafer measured using this method and via a commercially available interferometer. The deformations of wafers ground by #600 and #2000 diamond wheels were measured and the measurement error was less than 3% of the total deformation.