赵书霞

个人信息Personal Information

副教授

硕士生导师

性别:女

毕业院校:大连理工大学

学位:博士

所在单位:物理学院

学科:等离子体物理

办公地点:新三束实验室3号楼 201室

联系方式:0411-84709795-21

电子邮箱:zhaonie@dlut.edu.cn

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个人简介Personal Profile

Shu-Xia Zhao, Femail, associate professor, supervisor of master students. She is engaged in the numerical simulation study of low temperature plasma source and the related etching and deposition processes. The simulation tools she used include fluid model, particle model, and hybrid model. With these models, she sequently studied the discharge characteristics of nitrogen parallel plate and hollow cathode discharge, mode transition mechanism of radio frequency inductively coupled plasma, discharge feature and etching scheme of fluorocarbon plasma, and background gas transport and its coupling scheme with plasma, etc.  Now, she is focused on the discharge structure of electronegative capacitive and inductive plasma sources, with both the fluid and particle models. Of importance is that she is attempting to reveal the behind mechanism for the already discovered novel discharge modes, such as DA and stratified structures.  At the helps of these efforts, she is establishing new dishcarge theory, such as self-coagulation, and collecting many already known old discharge theories, such as parabola, elliptic and flat-top theories. 


Publication:

1. Lian-Zhu Zhang*, Shu-Xia Zhao, Xiu-Lan Meng, “Characterization of nitrogen glow discharge plasma via optical emission spectrum simulation”, Plasma Sci. and Tech., 10, 455 (2008).

2. Shu-Xia Zhao and Lian-Zhu Zhang*, "PIC/MCC simulation of nitrogen glow discharge plasma process", Nuclear fusioni and plasma Physics, 29, 39-43 (2009). (in Chinese)

3. Shu-Xia Zhao, Xiang Xu, Xue-Chun Li and You-Nian Wang*, "Fluid simulation of the E-H mode transition in inductively coupled plasma", J. Appl. Phys. 105, 083306 (2009).

4. Shu-Xia Zhao, Fei Gao and You-Nian Wang*, "Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model", J. Phys. D: Appl. Phys. 42, 225203 (2009).

5. Fei Gao, Shu-Xia Zhao and You-Nian Wang*, "Comparison between experiment and simulation for Ar inductively coupled plasma", Phys. Plasmas 16, 113502, (2009).

6. Wei Jiang, Hong-Yu Wang, Shu-Xia Zhao, and You-Nian Wang*, "Hysteresis induced by gap length effects in CCP at low pressure", J. Phys. D: Appl. Phys., 42, 102005 (2009)

7. Shu-Xia Zhao, and You-Nian Wang*, "Investigation of the effect of metastable atoms on mode transition in argon inductive discharge via a hybrid model ", J. Phys. D: Appl. Phys. 43, 275203 (2010).

8. Fei Gao, Shu-Xia Zhao, Xiao-Song Li and You-Nian Wang*, "Effects of matching network on the hysteresis during E and H mode transitions in argon inductively coupled plasma ", Phys. Plasmas 17, 103507 (2010).

9. Yu-Ru Zhang, Xiang Xu, Shu-Xia Zhao, Annemie Bogaerts, and You-Nian Wang*, "Comparison of electrostatic and electromagnetic simulations for very high frequency plasma", Phys. Plasmas, 17, 113512 (2010).

10. Xiang Xu, Shu-Xia Zhao, Yu-Ru Zhang, and You-Nian Wang*, "Phase-shift effect in capacitively coupled plasmas with two radio frequency or very high frequency sources", J. Appl. Phys., 108, 043308 (2010).

11. Xue-Jiao Si, Shu-Xia Zhao, Xiang Xu, Annemie Bogaerts and You-Nian Wang*, "Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma", Phys. Plasmas, 18, 033504 (2011).

12. Shu-Xia Zhao*, Fei Gao, You-Nian Wang and Annemie Bogaerts, "The effects of F2 attachment by low-energy electrons on the electron behavior in an Ar/CF4 inductively coupled plasma", Plasma Sources Sci. Technol. 21, 025008 (2012).

13. Quan-Zhi Zhang, Shu-Xia Zhao, Wei Jiang, and You-Nian Wang*, "Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas", J. Phys. D: Appl. Phys., 45, 305203 (2012).

14. Fei Gao, Xue-Chun Li, Shu-Xia Zhao, and You-Nian Wang*, "Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition", Chin. Phys. B, 21(7), 075203 (2012).

15. Shu-Xia Zhao*, Fei Gao, You-Nian Wang and Annemie Bogaerts, "Gas ratio effects on the Si etch rate and profile uniformity in an Ar/CF4 inductively coupled plasma", Plasma Sources Sci. Technol. 22, 015017 (2013).

16. Wei Liu, Fei Gao, Shu-Xia Zhao, Xue-Chun Li, and You-Nian Wang*, "Mode transitioin in CF4+Ar inductively coupled plasma", Phys. Plasmas, 20, 123513 (2013).

17. Fei Gao, Wei Liu, Shu-Xia Zhao, Yu-Ru Zhang, Chang-Sen Sun, and You-Nian Wang*, "Changes of the electron dynamics in hydrogen inductively coupled plasma", Chin. Phys. B, 22(11), 115205 (2013).

18. Fei Gao, Yu-Ru Zhang, Shu-Xia Zhao, and You-Nian Wang*, "Experimental ad numerical investigations of the phase-shift effect in capacitively coupled discharges", Phys. Plasmas, 21, 083507 (2014).

19. Shu-Xia Zhao*, Yu-Ru Zhang, Fei Gao, You-Nian Wang and Annemie Bogaerts, "Bulk plasma fragmentation in C4F8 inductively coupled plasma: a hybrid modeling study", J. Appl. Phys., 117(24), 243303 (2015).

20. Shu-Xia Zhao*, Fei Gao, Ya-Ping Wang, You-Nian Wang and Annemie Bogaerts, "Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma", J. Appl. Phys., 118(3), 033301 (2015).

21. Hui-Jing Xu,Shu-Xia Zhao*, Yu-Ru Zhang, Fei Gao, Xue-Chun Li, You-Nian Wang, "Equivalent circuit effects on mode transitions in H2 inductively coupled plasmas",Phys. Plasma, 22, 043508, (2015).

22. Hui-Jing Xu, Shu-Xia Zhao*, Fei Gao, Yu-Ru Zhang, Xue-Chun Li, You-Nian Wang, "Discontinuity of mode transition and hysteresis in hydrogen inductively coupled plasma via a fluid model", Chin. Phys. B, 24(11), 115201,(2015).

23. Wei, Liu, De-Qi Wen, Shu-Xia Zhao, Fei Gao, and You-Nian Wang*, "Characterization of O2 /Ar inductively coupled plasma studied by using a Langmuir probe and global model", Plasma Sources Sci. Technol. 24, 025035 (2015).

24. Liang Yang, Hui-Jie Yan, Xiao-Hua Qi, Shu-Xia Zhao, and Chun-Sheng Ren*, "Geometry Effects of SDBD Actuator on Atmospheric-Pressure Discharge Plasma Airflow Acceleration", IEEE Trans. Plasma Sci., 43(10), 3653 (2015).

25. Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, and You-Nian Wang*, "F-atoms kinetics in SF6/Ar inductively coupled plasma", J. Vac. Sci. Technol. A, 34(3), 031305 (2016).

26. Xi-Feng Wang, Yuan-Hong Song*, Shu-Xia Zhao, Zhong-Ling Dai, and You-Nian Wang, "Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge", Plasma Sci. Technol., 18(1), 1 (2016).

27. Shu-Xia Zhao* and Zhao Feng, "Gas flow characteristics of argon inductively coupled plasma and advections of plasma species under incompressible and compressible flows", Chin. Phys. B, 27(12), 124701 (2018).

28. Shu-Xia Zhao*, "Non-monotonic behavior of electron temperature in argon inductively coupled plasma and its analysis via novel electron mean energy equation", Phys. Plasmas, 25, 033516 (2018).

29. Shu-Xia Zha*, "Mode transition and hysteresis in inductively coupled plasma sources", Chap. 6 in the book of Plasma Science and Technology-Basic fundamentals and modern applications, Published by the IntechOpen limited, editted by Haikel Jelassi and Djamel Benredjem, 2019. (P. 89)

30. Shu-xia Zhao*, "Quasi-delta negative ions density of Ar/O2 inductively coupled plasma at very ow electronegativity", Chin. Phys. B, 30(5), 055201 (2021).

31. Shu-Xia Zhao* and Jing-Ze Li, "Delta distribution of electronegative plasma predicted by reformed spring oscillator dynamic equation with dispersing force", Chin. Phys. B, 30(5), 055202 (2021).

32. Wen-Hua Wang, Shu-Xia Zhao*, and Zhong-Ling Dai, "A self-consistent method for solving ion diffusion and mobility coefficients", Phys. Plasmas, 28, 103503 (2021). 

33. Wen-Hua Wang, Shu-Xia Zhao*, and Zhong-Ling Dai, "The impact of ion mobility coefficients on plasma discharge characteristics", Phys. Plasmas, 29, 073501 (2022).

34. Xiang-Mei Liu*, Xiao-Tian Dong, Hong-Ying Li, and Shu-Xia Zhao*, "The effects of dilution gas on nanoparticle growth in atmospheric-pressure acetylene microdischarges", Plasma Sci. Technol., 24, 105503 (2022).

35. Xiang-Mei Liu*, Wen-Jing Liu, Xi Zhang, Xiao-Tian Dong, and Shu-Xia Zhao*, "Effect of gas flow on the nanoparticles transport in dusty acetylene plasmas", Plasma Sci. Technol., 25, 105401 (2023).

36. Shu-Xia Zhao*, "Thinking about the wave-partice durality with plasma theory and explaining it based on the oscillator and qseudo-oscillator models", Global Journal of Science Frontier Research A, 23(5), 71 (2023). (Open access)

  • 教育经历Education Background
  • 工作经历Work Experience
  • 研究方向Research Focus
  • 社会兼职Social Affiliations
  • 具有自主知识产权的大型源代码的编写和调试

  • COMSOL多物理场耦合和PEGSUS低温等离子体模拟商业软件的使用

  • 低气压射频等离子体源背景气体和中性基团的输运机制

  • 低气压射频容性和感性耦合放电的流体动力学模型研究

  • 碳氟等离子体源的放电特性和硅材料的刻蚀机理

  • 射频感性耦合等离子体放电模式转化机理的混合模拟研究

  • 氮气直流平板和空心阴极辉光放电特性的PIC/MCC模拟研究

  • 低温等离子体源的多物理场数值仿真技术