大连理工大学  登录  English 
刘爱民
点赞:

教授   博士生导师   硕士生导师

性别: 男

毕业院校: 中科院半导体所

学位: 博士

所在单位: 物理学院

电子邮箱: aiminl@dlut.edu.cn

手机版

访问量:

开通时间: ..

最后更新时间: ..

当前位置: 中文版 >> 科学研究 >> 论文发表
Influence of energy band of n+ a-Si thin films on performance of IBC-SHJ solar cells

点击次数:

论文类型: 会议论文

发表时间: 2019-06-12

收录刊物: EI

摘要: Interdigitated back contact silicon heterojunction (IBC-SHJ) solar cells exhibit excellent performance because of the combination of IBC structure and SHJ technology. The front surface field (FSF) which consists of chemical passivated layer and electrical field passivated layer, has proved to be very important for achieving high conversion efficiency. In term of electrical field passivated layer, the n+doped thin films based on alloys of Si with carbon or oxygen in amorphous phases (n+a-Si) is present by Sentaurus TCAD to investigate energy band performance. The simulation result indicates that the n+a-Si layer with wider energy band reduces the light absorption on the front surface effectively, results in large improvement in short circuit current density (Jsc). As field passivated layer, the wider energy band of n+ a-Si leads no effect on better passivation. The main role creating electrical field is doping concentration, and field passivation effect enhance as doping concentration increasing. With the better optical performance and field passivation, the conversion efficiency achieve above 26% on the poor interfacial chemical passivation using wider n+a-Si layer on the front surface. ? 2019 IEEE.

辽ICP备05001357号 地址:中国·辽宁省大连市甘井子区凌工路2号 邮编:116024
版权所有:大连理工大学