hhcQdVWieyDjIrWIHXi0onBRbdds7PSO8r67em4uVpJNgtPwSpJQ38OZNWmv

Study of the growth behavior of the AlN thin film deposited by RMPECVD

Release Time:2023-03-30  Hits:

Date of Publication: 2022-10-08

Journal: the 6th international forum on advanced material science and technology,Hong Kong

Institution: 材料科学与工程学院

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