Influence of Ar/H-2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Release Time:2023-04-10 Hits:
Date of Publication: 2022-10-03
Journal: THIN SOLID FILMS
Volume: 521
Page Number: 181-184
ISSN: 0040-6090