location： Current position: Aimin Wu >> Scientific Research >> Paper Publications

Influence of Ar/H-2 ratio on the characteristics of boron-doped nc-Si:H films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Hits:

Date of Publication:2022-10-03

Journal:SURFACE COATINGS TECHNOLOGY

Volume:228

Issue:SUPPL.1

Page Number:S412-S415

ISSN No.:0257-8972

Next One:Influence of Ar/H-2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep