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发表时间:2022-10-06
发表刊物:MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
所属单位:光电工程与仪器科学学院
卷号:41
页面范围:291-296
ISSN号:1369-8001
上一条:Synthesis of GaN network by nitridation of hexagonal epsilon-Ga2O3 film
下一条:Low Al-composition p-GaN/Mg-doped Al0.25Ga0.75N/n(+)-GaN polarization-induced backward tunneling junction grown by metal-organic chemical vapor deposition on sapphire substrate