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    高飞

    • 教授     博士生导师 硕士生导师
    • 主要任职:集成电路学院党委书记
    • 性别:男
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:集成电路学院
    • 学科:等离子体物理
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    Experimental investigations of the plasma radial uniformity in single and dual frequency capacitively coupled argon discharges

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      发布时间:2019-03-12

      论文类型:期刊论文

      发表时间:2016-12-01

      发表刊物:PHYSICS OF PLASMAS

      收录刊物:Scopus、EI、SCIE

      卷号:23

      期号:12

      ISSN号:1070-664X

      摘要:In the current work, the radial plasma density has been measured by utilizing a floating double probe in single and dual frequency capacitively coupled argon discharges operated in a cylindrical reactor, aiming at a better understanding of electromagnetic effects and exploring a method of improving the radial uniformity. The experimental results indicate that for single-frequency plasma sustained at low pressure, the plasma density radial profile exhibits a parabolic distribution at 90 MHz, whereas at 180 MHz, the profile evolves into a bimodal distribution, and both cases indicate poor uniformities. With increasing the pressure, the plasma radial uniformity becomes better for both driving frequency cases. By contrast, when discharges are excited by two frequencies (i.e., 90 + 180MHz), the plasma radial profile is simultaneously influenced by both sources. It is found that by adjusting the low-frequency to high-frequency voltage amplitude ratio beta, the radial profile of plasma density could be controlled and optimized for a wide pressure range. To gain a better plasma uniformity, it is necessary to consider the balance between the standing wave effect, which leads to a maximum plasma density at the reactor center, and the edge field effect, which is responsible for a maximum density near the radial electrode edge. This balance can be controlled either by selecting a proper gas pressure or by adjusting the ratio b. Published by AIP Publishing.