高峻峰

个人信息Personal Information

教授

博士生导师

硕士生导师

主要任职:大连理工大学白俄罗斯国立大学联合学院副院长

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:物理学院

学科:凝聚态物理

办公地点:中白学院252

电子邮箱:gaojf@dlut.edu.cn

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An Exchange Intercalation Mechanism for the Formation of a Two-Dimensional Si Structure Underneath Graphene

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论文类型:期刊论文

发表时间:2012-05-01

发表刊物:NANO RESEARCH

收录刊物:SCIE、CSCD

卷号:5

期号:5

页面范围:352-360

ISSN号:1998-0124

关键字:Graphene; photoemission electron microscopy (PEEM); low energy electron microscopy (LEEM); intercalation; silicon; Ru(0001)

摘要:A two-dimensional (2D) Si film can form between a graphene overlayer and a Ru(0001) substrate through an intercalation process. At the graphene/2D-Si/Ru(0001) surface, the topmost graphene layer is decoupled from the Ru substrate and becomes quasi-freestanding. The interfacial Si layers show high stability due to the protection from the graphene cover. Surface science measurements indicate that the surface Si atoms can penetrate through the graphene lattice, and density functional theory calculations suggest a Si-C exchange mechanism facilitates the penetration of Si at mild temperatures. The new mechanism may be involved for other elements on graphene, if they can bond strongly with carbon. This finding opens a new route to form 2D interfacial layers between graphene and substrates.