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Ti/TiN multilayer thin films deposited by pulse biased arc ion plating

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Indexed by:期刊论文

Date of Publication:2011-01-15

Journal:APPLIED SURFACE SCIENCE

Included Journals:SCIE、EI

Volume:257

Issue:7

Page Number:2683-2688

ISSN No.:0169-4332

Key Words:Multilayer films; Pulse biased arc ion plating; Hardness; Adhesion

Abstract:In this work, the effect of modulation period (A) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and crosssectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. (C) 2010 Elsevier B.V. All rights reserved.

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