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论文类型：期刊论文

发表时间：2014-04-01

发表刊物：CHINESE PHYSICS B

收录刊物：SCIE、EI、ISTIC

卷号：23

期号：4

ISSN号：1674-1056

关键字：arc ion plating; Ti-C-N film; nitrogen flow rate; microstructure

摘要：In this paper, Ti-C-N nanocomposite films are deposited under different nitrogen flow rates by pulsed bias arc ion plating using Ti and graphite targets in the Ar/N2 mixture gas. The surface morphologies, compositions, microstructures, and mechanical properties of the Ti-C-N films are investigated systematically by field emission scanning electron microscopy (FE-SEM), x-ray photoelectron spectroscopy (XPS), grazing incident x-ray diffraction (GIXRD), Raman spectra, and nano-indentation. The results show that the nanocrystalline Ti(C,N) phase precipitates in the film from GIXRD and XPS analysis, and Raman spectra prove the presence of diamond-like carbon, indicating the formation of nanocomposite film with microstructures comprising nanocrystalline Ti(C,N) phase embedded into a diamond-like matrix. The nitrogen flow rate has a significant effect on the composition, structure, and properties of the film. The nano-hardness and elastic modulus first increase and then decrease as nitrogen flow rate increases, reaching a maximum of 34.3 GPa and 383.2 GPa, at a nitrogen flow rate of 90 sccm, respectively.