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论文类型：期刊论文

发表时间：2014-08-15

发表刊物：NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

收录刊物：SCIE、EI、Scopus

卷号：333

页面范围：1-5

ISSN号：0168-583X

关键字：Ti-C-N films; Pulsed bias voltage; Arc ion plating; Nano-indentation

摘要：The influence of pulsed bias voltage on the structure and mechanical properties of Ti-C-N composite films prepared by pulsed bias arc ion plating was systematically investigated. The microstructure, surface morphology and bonding structure of the films were evaluated with grazing incidence X-ray diffraction, high resolution transmission electron microscopy, Raman and X-ray photoelectron spectroscopy, and scanning electron microscope. The mechanical properties such as hardness and elastic modulus were measured by nano-indentation. A composite structure consisting of nanocrystallites Ti(C,N) and amorphous carbon is observed. The surface morphology indicates that the size and amount of macroparticles at the film surface decrease with the increase of bias voltage. Applying a bias voltage of -300 V in Ti-C-N films induces strong crystalline characteristic. However, other bias voltages cause a tendency to a lower degree of crystallinity and an enhanced fraction of amorphous phase. With increasing the bias voltages from -100 V to -700 V, the corresponding hardness and elastic modulus increase firstly and then decrease, reaching a maximum value of 32.5 GPa and 367.4 GP at the bias voltage of -300 V. (C) 2014 Elsevier B.V. All rights reserved.