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论文类型：期刊论文

发表时间：2012-09-25

发表刊物：Advanced Materials Research

收录刊物：EI、CPCI-S、Scopus

卷号：565

页面范围：105-110

ISSN号：9783037854679

关键字：Sapphire Substrate; CMG; Grinding Tool; Surface Roughness; MRR

摘要：In order to improve the surface quality of sapphire substrates ground by diamond wheel, the chemo-mechanical grinding (CMG) tools for sapphire grinding was investigated in this paper. According to the processing principle of CMG, three CMG tools with different abrasives of SiO2, Fe2O3 and MgO were developed respectively. The compositions of the CMG tools were designed and optimized based on the physicochemical characteristics of sapphire. The grinding experiments were performed with the developed CMG tools and the grinding performance of three kind of tools were evaluated by comparing the surface roughness and the MRR of sapphire. The experiment results show that the grinding performance of SiO2 CMG tool was worst. The surface roughness and MRR corresponding to SiO2 CMG tool were all significantly poorer than Fe2O3 and MgO CMG tools. The highest MRR could be obtained by Fe2O3 CMG tool, but the best surface quality was obtained by MgO CMG tool.