点击次数：

论文类型：会议论文

发表时间：2008-09-20

收录刊物：EI、CPCI-S

卷号：53-54

页面范围：125-130

关键字：Chemical mechanical polishing (CMP); Endpoint detection (EPD); Friction

摘要：Chemical mechanical polishing (CMP) has been extensively used in the integrate circuit (IC) manufacturing industry as a widely accepted global planarization technology, accurate in situ endpoint detection of CMP process can reduce the product variance, significantly improve yield and throughput. A CMP in situ endpoint detection system, which measured the friction and downforce during CMP process using a specially designed three-axis strain gauge force sensor, was developed. The frictional transition from copper (Cu) to tantalum (Ta) barrier as well as Ta barrier to silicon dioxide (SiO2) dielectric was detected during CMP process. The experimental results showed that the change of friction could be detected when the polished material changed. The developed CMP in situ endpoint detection system is feasible for 300 mm and 450 mm copper CMP process.