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A new magnetic enhanced chemical mechanical polishing method for quartz glass slender holes
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Date of Publication:2024-05-22

Journal:Journal of Materials Processing Technology

Volume:327

ISSN No.:0924-0136

Key Words:Aspect ratio; Cerium oxide; High quality; Internal surfaces; Large aspect ratio; Magnetic-field; Magnetic fields; Material removal; Particle size analysis; Process parameters; Quartz; Quartz glass; Slende hole; Surface properties; Surface reactions; Surface roughness; Synergistic effect; Workpiece

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Senior Engineer
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates

Gender:Male

Alma Mater:The University of Tokyo

Degree:Doctoral Degree

School/Department:Department of Mechanical Engineering

Discipline:Mechanical Manufacture and Automation

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