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Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Radio-Frequency Discharge

Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2011-10-01

Journal: PLASMA SCIENCE & TECHNOLOGY

Included Journals: EI、SCIE、Scopus

Volume: 13

Issue: 5

Page Number: 561-566

ISSN: 1009-0630

Key Words: RF discharge; optical emission spectroscopy; Langmuir probe

Abstract: Optical emission spectroscopy and Langmuir Probe diagnostics were incorporated into the experiment, in which dust particles were formed in-situ by using reactive mixture gases (SiH4/C2H4/Ar) in a radio-frequency (RF) discharge plasma. The excitation temperature was first calculated by combining several optical emission spectra of argon lines and using a Boltzmann distribution to fit the experimental data, then the excitation temperature as functions of both gas pressure and RF power in SiH4/C2H4/Ar discharges for different discharge conditions were obtained. Correspondingly, based on the measurement of the electron temperature by a Langmuir probe, the excitation temperature was compared with the electron temperature, and some discussions were presented. Finally the emission intensities of spectral lines of Si 390.6 nm, Si2+ 380.6 nm and C+ 426.7 nm were measured and presented as functions of pressure, RF power and flow rate of SiH4/C2H4.

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