ZnO films growth at different temperature on the substrate of Corning glass by MOCVD
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发布时间：2019-03-11
论文类型：会议论文
发表时间：2009-08-02
收录刊物：Scopus、CPCI-S、EI
卷号：428-429
页面范围：447-+
关键字：ZnO; Thin Films; Growth; Glass; MOCVD
摘要：We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at similar to 34.46 degrees, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).
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