Double-layer resist method to improve descum result when removing negative photoresist
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发布时间：2022-06-09
发表时间：2019-01-01
发表刊物：MICRO & NANO LETTERS
卷号：14
期号：6
页面范围：694-697
ISSN号：1750-0443
关键字："photoresists; viscosity; etching; negative photoresist scum; low viscosity positive photoresist; AZ703; double-layer resist method; optimal retracting distance; bottom layer resist; top layer resist; top layer contact; size 8; 0 mum; size 1; 10 mum"
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