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论文类型：期刊论文

发表时间：2012-10-30

发表刊物：3rd International Conference on Microelectronics and Plasma Technology (ICMAP)

收录刊物：SCIE、EI、CPCI-S、Scopus

卷号：521

页面范围：141-145

ISSN号：0040-6090

关键字：Capacitively coupled plasma; Langmuir probe; Optical spectroscopy; Mass spectrometry

摘要：Capacitively coupled plasma (CCP) is one of the most common industrial plasma sources. Experimental characterization plays key roles in understanding the complex physics involved in CCP, and is based on various probes, optical monitoring and mass spectrometry. Some recent configurations of capacitive discharge like dual frequency CCP, direct current CCP and electric asymmetric CCP have been extensively studied experimentally with these methods. In this paper, we review these recent experimental progresses of CCP studies. (C) 2012 Elsevier B.V. All rights reserved.