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发表时间：2022-10-05
发表刊物：AIP Advances
卷号：8
期号：11
ISSN号：2158-3226
上一条：Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique
下一条：Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputtering
