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发表时间:2022-10-08
发表刊物:Plasma Science and Technology
卷号:14
期号:2
页面范围:172-176
ISSN号:1009-0630
上一条:Photoluminescence properties of the Yb : Er co-doped Al2O3 thin film fabricated by microwave ECR plasma source enhanced RF magnetron sputtering
下一条:Preparation of TiOx/gamma-Al2O3 catalyst on powdery gamma-Al2O3 by using reactive sputtering deposition