大连理工大学主页平台管理系统 YongXin Liu--yxliu-- A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

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A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

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Date of Publication:2025-10-24

Journal:JOURNAL OF PHYSICS D-APPLIED PHYSICS

Volume:58

Issue:36

ISSN No.:0022-3727

Key Words:GAS; MECHANISMS; NF3; SURFACE

Next One:Dynamics of electron power absorption in capacitive radio-frequency CF4 plasmas operating in the striation mode

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Supervisor of Doctorate Candidates
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Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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