大连理工大学主页平台管理系统 YongXin Liu Low-frequency dependence of plasma characteristics in dual-frequency capacitively coupled plasma sources yxliu

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Dynamics of electron power absorption in capacitive radio-frequency CF4 plasmas operating in the striation mode

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Indexed by:Journal Papers

Document Code:584596

Date of Publication:2025-08-01

Journal:PLASMA SOURCES SCIENCE & TECHNOLOGY

Volume:34

Issue:8

ISSN:0963-0252

Key Words:DISCHARGE; ENERGY; PARTICLE-IN-CELL

Pre One : A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

Next One : Discharge similarity in capacitive radio frequency carbon tetrafluoride plasmas

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Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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