张权治
Associate Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates
Gender:Male
Date of Birth:1987-01-01
Alma Mater:大连理工大学
Degree:Doctoral Degree
School/Department:物理学院
Discipline:Plasma physics
Business Address:大连理工大学 物理学院303
E-Mail:qzzhang@dlut.edu.cn
Hits:
Indexed by:期刊论文
Date of Publication:2011-07-20
Journal:JOURNAL OF PHYSICS D-APPLIED PHYSICS
Included Journals:SCIE、EI
Volume:44
Issue:28
ISSN No.:0022-3727
Abstract:Using a combined experimental, numerical and analytical approach, we investigate the control of plasma properties via the electrical asymmetry effect (EAE) in a capacitively coupled oxygen discharge. In particular, we present the first experimental investigation of the EAE in electronegative discharges. A dual-frequency voltage source of 13.56MHz and 27.12MHz is applied to the powered electrode and the discharge symmetry is controlled by adjusting the phase angle theta between the two harmonics. It is found that the bulk position and density profiles of positive ions, negative ions, and electrons have a clear dependence on theta, while the peak densities and the electronegativity stay rather constant, largely due to the fact that the time-averaged power absorption by electrons is almost independent of.. This indicates that the ion flux towards the powered electrode remains almost constant. Meanwhile, the dc self-bias and, consequently, the sheath widths and potential profile can be effectively tuned by varying theta. This enables a flexible control of the ion bombarding energy at the electrode. Therefore, our work proves the effectiveness of the EAE to realize separate control of ion flux and ion energy in electronegative discharges. At low pressure, the strength of resonance oscillations, which are found in the current of asymmetric discharges, can be controlled with theta.
大连理工大学-副教授(2019年7月入职),大连理工大学“星海青千”(人才计划)。2014年6月,分别在大连理工大学和比利时-安特卫普大学(University of Antwerp)获得双博士学位。2014年8月-2016年5月,曾工作在华为技术有限公司-2012实验室。2016年6月-2019年6月,在比利时-安特卫普大学从事博士后研究工作三年 (前两年是玛丽居里学者)。
主要是针对低温等离子体技术中的关键物理问题及关键技术开展科学研究,如等离子体源电非对称效应问题的研究和等离子体刻蚀多孔材料问题的研究。
在低温等离子体物理中的物理建模、PIC/MC的模型(1、2维隐格式)、大规模并行计算、以及相关的数值仿真模拟有着独到的见解和创新,目前在Physical Review Letters, Plasma Sources Science and Technology, Applied Physics Letters等期刊上发表SCI论文27篇,论文总引用超过150次,其中2篇文章的他引超过30次。
结合模拟和实验工作,首次验证了双频 容性耦合等离子体 中的无碰撞“反弹共振加热机制”,并通过数值模拟揭示了这种加热机制的物理图像。该研究成果发表在国际顶级期刊 Phys. Rev. Lett. (JCR 1 区)上(全权负责理论模拟,皆为论文的第二作者;第一作者为实验负责人)。
针对多孔材料的等离子体低温刻蚀的系统研究,引起了国内外的广泛关注,知名的半导体技术网站“SEMICONDUCTOR ENGINEERING”对该课题进行了专题报道https://semiengineering.com/cryogenic-etch-re-emerges/。
2016年获得欧盟地平线2020玛丽居里奖-‘玛丽居里学者’(Horizon 2020 - MARIE CURIE ACTIONS: Individual Fellowship),该奖项是欧洲竞争最为激烈的青年基金(2016年的总申请人数6667人,资助率仅为14.2%)。
2019年,被德国波鸿-鲁尔大学(Ruhr-Universität Bochum;RUB) 聘为‘墨卡托学者’(Mercator Fellow)-外聘专家。
长期与国内外开展相关研究的课题组保持着紧密联系,如比利时University of Antwerp 大学的Annemie Bogaerts(欧洲科学院院士)团队、德国Ruhr-Universität Bochum大学的Uwe Czarnetzki (Plasma Sources Science and Technology主编)团队,以及欧洲微电子研究中心(IMEC);合作形式主要表现在合作研究科学难点、共同发表学术论文、协助指导研究生等。
招生专业:物理、数学、计算机、电气、力学、化工....
教育经历:
2005.09-2009.07 大连理工大学 物理与光电工程学院 应用物理 学士
2009.09-2014.07 大连理工大学 物理与光电工程学院 等离子体物理 博士
2013.10-2014.04 比利时-安特卫普大学 化学学院 等离子体化学 博士(联合培养-双博士学位)
工作经历:
2014.08-2016.05华为技术有限公司(2012实验室) 研究工程师
2016.06-2019.06比利时-安特卫普大学 博士后(玛丽居里学者)
发表论文:
Yu-Qing Guo, Jing-Yu Sun, Quan-Zhi Zhang*(通讯) et al, “Modulation of uniform magnetic field on electron dynamics in low‐pressure capacitively coupled plasmas”, Plasma Process Polym. 2021;e2100072
Quan-Zhi Zhang et al, “Cryogenic etching of porous material”, Acta Physica Sinica, 70, 098104 (2021)
Quan-Zhi Zhang* et al, “Computational study of simultaneous positive and negative streamer propagation in a twin surface dielectric barrier discharge via 2D PIC simula” Plasma Sources Sci. Technol. Accepted
Yongxin Liu, ... Quan-Zhi Zhang* Plasma Sources Sci. Technol. 29 (2020) 12LT03 (6pp) letter
Xiao-Kun Wang,... Quan-Zhi Zhang*( co-corresponding author),“The effect of a negative direct-current voltage on striated structures and electrical parameters in a capacitively coupled rf discharge in CF4” Plasma Sources Sci. Technol. Accepted
Jing-Yu Sun, Quan-Zhi Zhang*, and You-Nian Wang Phys. Plasmas 28, 013509 (2021);
Quan-Zhi Zhang* et al, Plasma Process Polym. 2021;e2000234 (封面文章)
Quan-Zhi Zhang*, WeiZong Wang, Christophe Thille and Annemie Bogaerts “H2S Decomposition into H2 and S2 by Plasma Technology: Comparison of Gliding Arc and Microwave Plasma” , Plasma Chemistry and Plasma Processing (2020) 40:1163–1187
Jing-Yu Sun, Quan-Zhi Zhang*, Jia-Rui Liu, Yuan-Hong Song and You-Nian Wang “Electrical asymmetry effect in inhomogeneously magnetized capacitively coupled plasmas”, Plasma Sources Sci. Technol. Accepted
Jing-Yu Sun, Quan-Zhi Zhang*, Yong-Xin Liu and You-Nian Wang “Realistic treatment for secondary electron emission in hybrid DC/DF capacitively coupled discharge”, Plasma Sources Sci. Technol. 29 (2020) 024001
Quan-Zhi Zhang*, and Annemie Bogaerts, “Plasma streamer propagation in structured catalysts”, Plasma Sources Sci. Technol. 27 (2018) 105013
Quan-Zhi Zhang*, and Annemie Bogaerts, “Capacitive electrical asymmetry effect in an inductively coupled plasma reactor”, Plasma Sources Sci. Technol. 27 (2018) 105019
Quan-Zhi Zhang*, Wei-Zong Wang* and Annemie Bogaerts*,“Importance of surface charging during plasma streamer propagation in catalyst pores”, Plasma Sources Sci. Technol. 27 ( 2018) 065009
Quan-Zhi Zhang*, and Annemie Bogaerts*, “Propagation of a plasma streamer in catalyst pores”, Plasma Sources Sci. Technol, 27 (2018) 035009
Quan-Zhi Zhang*, Stefan Tinck, Jean-Francois de Marneffe, Liping Zhang, and Annemie Bogaerts. “Mechanisms for plasma cryogenic etching of porous materials” Appl. Phys. Lett. 111, 173104 (2017)
Quan-Zhi Zhang, You-Nian Wang and Annemie Bogaerts. “Heating mode transition in a hybrid direct current/dual-frequency capacitively coupled CF4 discharge”, J. Appl. Phys., 115, 223302 (2014)
Quan-Zhi Zhang, Yong-Xin Liu, Wei Jiang, Annemie Bogaerts and You-Nian Wang. “Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”, Plasma Sources Sci. Technol. 22, 025014 (2013)
Quan-Zhi Zhang, Shu-Xia Zhao, Wei Jiang, and You-Nian Wang. “Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasma”, J. Phys. D: Appl. Phys. 45, 305203 (2012)
Quan-Zhi Zhang, Wei Jiang, Lu-Jing Hou, and You-Nian Wang. “Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge”, J. Appl. Phys. 109, 013308 (2011)
Quan-Zhi Zhang, Wei Jiang, Shu-Xia Zhao, and You-Nian Wang. “Surface-charging effect of capacitively coupled plasmas driven by combined dc/rf sources”, J. Vac. Sci. Technol. A 28, 287 (2010)
Li Wang, De-Qi Wen, Quan-Zhi Zhang, Yuan-Hong Song, Yu-Ru Zhang, You-Nian Wang, “Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges”, Plasma Sources Sci. Technol. 2019 (accepted)
Annemie Bogaerts, Quan-Zhi Zhang, ZhangYu-Ru, Koen Van Laer, Weizong Wang, “Burning questions of plasma catalysis: Answers by modeling”, Catalysis Today. 2019 (accepted)
Jing-Yu Sun, De-Qi Wen, Quan-Zhi Zhang, Yong-Xin Liu, and You-Nian Wang, “The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials”,Phys. Plasmas. 2019 (accepted)
WenZhu Jia, Quan-Zhi Zhang, XiFeng Wang, Yuan-Hong Song, Ying-Ying Zhang, You-Nian Wang, “Effect of dust particle size on the plasma characteristics in a radio frequency capacitively coupled silane plasma”, J. Phys. D: Appl. Phys. 52 (2019) 015206
Jian-Guo Gu, Ya Zhang, Mingxiang Gao, Hong-Yu Wang, Quan-Zhi Zhang, Lin Yi, Wei Jiang, “Enhancement of surface discharge in catalyst pores in dielectric barrier discharges”, J. Appl. Phys. 2019 (accepted)
Mingxiang Gao, Ya Zhang*, Hongyu Wang, Bin Guo, Quanzhi Zhang, Annemie Bogaerts,“Mode transition of filaments in packed-bed dielectric barrier discharges”, Catalysts. 8 (2018) 248
Weizong Wang*, Antonin Berthelot, Quanzhi Zhang, and Annemie Bogaerts*, “Modelling of plasma-based dry reforming: How do uncertainties in the 2 input data affect the calculation results?”, J. Phys. D: Appl. Phys. 51 (2018) 204003
De-Qi Wen, Quan-Zhi Zhang, Wei Jiang, Yuan-Hong Song, Annemie Bogaerts and You-Nian Wang. “Phase modulation in pulsed dual-frequency capacitively coupled plasmas” J. Appl. Phys. 115, 233303 (2014)
Ya Zhang, Wei Jiang, Quan-Zhi Zhang, and Annemie Bogaerts. “Computational study of plasma sustainability in radio frequency micro-discharges” J. Appl. Phys., 115, 193301(2014)
Jia Liu, Quan-Zhi Zhang, Yong-Xin Liu, Fei Gao, You-Nian Wang. “Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O2 discharges” J. Phys. D: Appl. Phys. 46, 235202 (2013)
Yong-Xin Liu, Quan-Zhi Zhang, Jia Liu, Yuan-Hong Song, Annemie Bogaerts and You-Nian Wang. “Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges” Plasma Sources Sci. Technol. 22, 025012 (2013)
Yong-Xin Liu, Quan-Zhi Zhang, Jia Liu, Yuan-Hong Song, Annemie Bogaerts and You-Nian Wang. “Effect of bulk electric field reversal on the bounce resonance heating in dual-frequency capacitively coupled electronegative plasmas” Appl. Phys. Lett. 101, 114101 (2012)
Yong-Xin Liu, Quan-Zhi Zhang, Wei Jiang, Xiang-Zhan Jiang, Wen-Qi Lu, and You-Nian Wang. “Experimental validation and simulation of collisionless bounce-resonance heating in capacitively coupled radio-frequency discharges” Plasma Sources Sci. Technol. 21, 035010 (2012)
Yong-Xin Liu, Quan-Zhi Zhang, Wei Jiang, Xiang-Zhan Jiang, Wen-Qi Lu, You-Nian Wang and Lu-Jing Hou. “Collisionless bounce resonance heating in dual-frequency capacitively coupled plasmas” Phys. Rev. Lett. 107, 055002 (2011)
Jing Bai, Jizhong Sun, Quanzhi Zhang, Dezhen Wang. “PIC simulation of RF hydrogen discharges in a transverse magnetic field”, Current Applied Physics 11, 140-144 (2011)
E Schungel, Q-Z Zhang, S Iwashita, J Schulze, L-J Hou, Y-N Wang and U Czarnetzki. “Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect”, J. Phys. D: Appl. Phys. 44 285205 (2011)
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