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发布时间：2019-03-09

论文类型：期刊论文

发表时间：2014-12-01

发表刊物：SURFACE ENGINEERING

收录刊物：Scopus、EI、SCIE

卷号：30

期号：12

页面范围：900-904

ISSN号：0267-0844

关键字：Thickness; Roughness; Amorphous; Hardness

摘要：This work explored the effect of deposition pressure on the properties of the ternary Al-Mg-B thin films deposited on Si substrate at high deposition temperature (600 degrees C) by magnetron sputtering system with one pure boron target and one Al/Mg co-target. The influences of the deposition pressure on the elemental contents, deposition rate, surface roughness, structure and mechanical properties were investigated by Electron microprobe analysis (EPMA), 3D surface profiler, X-ray diffraction (XRD), Fourier transforms infrared spectroscopy (FTIR), and nanoindentation experiments respectively. Experimental results indicated that the amorphous thin films deposited at 0.5 Pa had a smooth surface and displayed the maximum hardness and Young's modulus of 35 and 322 GPa respectively. From the results of this work, high quality Al-Mg-B hard thin films can be obtained by magnetron sputtering under an optimum deposition pressure of 0.5 Pa.