Title of Paper:带有射频偏压源的感性耦合 Ar/O2/Cl2 等离子体放电的混合模拟研究
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Date of Publication:2024-08-01
Journal:ACTA PHYSICA SINICA
Volume:73
Issue:4
ISSN No.:1000-3290
Key Words:CHLORINE PLASMAS; DIAGNOSTICS; DYNAMICS; ELECTRON; ENERGY-DISTRIBUTION; ETCHING CHARACTERISTICS; MODEL; PROFILE EVOLUTION; SHEATH; SILICON
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